LD前工艺中的ECR
<P>小弟正在做ecr，就是电子回旋共振。</P><P>该仪器公司有说明如下：<FONT face=Verdana>The system is designed to permit surface processing by an ECR generated plasma of up to quantity three, 2" diameter, or a single 5" wafer subject to temperature control and RF bias. Vacuum pressure in the main chamber is capable of reaching pressures less than 1x10-10m.bar with turbo-molecular pumping plus optional titanium sublimation pumping. Vacuum ports are available for diagnostic and gas introduction. </FONT></P>
<P><FONT face=Verdana size=-1>The system is installed as shown on a support table with 19" electrical rack and one power distribution panel. The electrical system will require extra power with customer supplied breakefor the ECR source to supply the 1 kW 208 VAC 1 phase, 15 Amp microwave source and two magnets requiring 208 VAC 3 phase, 20 Amp and 208 VAC 3 phase, 15 Amp. Vacuum integrity via a leak test to 2x10-10 Torr 1/sec He, along with sample transfer and heating, will be demonstrated. </FONT></P>
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<P><b><FONT face=Verdana>不知各位大虾可有用过，若有，指点一二，不尽感激。</FONT></b></P>
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